Artifact-free sample preparation of metal thin films using Xe plasma-focused ion beam milling for atomic resolution and in situ biasing analyses
| Autor: | Lee, Hee-Beom, Kim, Seon Je, Jung, Min-Hyoung, Kim, Young-Hoon, Kim, Su Jae, Gao, Hai-Feng, Van Leer, Brandon, Jeong, Se-Young, Jeong, Hu Young, Kim, Young-Min |
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| Zdroj: | In Materials Characterization October 2024 216 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect