Resistant behavior of a novel silica-based octyl(phenyl)- N, N-diisobutyl carbamoylmethylphoshine oxide neutral extraction resin against nitric acid, temperature and γ-radiation
| Autor: | Zhang, Anyun *, Wei, Yuezhou, Kumagai, Mikio, Koma, Yoshikazu, Koyama, Tomozo |
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| Zdroj: | In Radiation Physics and Chemistry 2005 72(4):455-463 |
| Databáze: | ScienceDirect |
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