A new process for minimizing residual silicon and carbon of reaction-bonded silicon carbide via chemical vapor deposition
Autor: | Lee, Jisu, Kim, Daejong *, Shin, Dongwook, Lee, Hyeon-Geun, Park, Ji Yeon, Kim, Weon-Ju |
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Zdroj: | In Journal of the European Ceramic Society July 2021 41(7):4000-4005 |
Databáze: | ScienceDirect |
Externí odkaz: |