Boron diffusion in silicon: the anomalies and control by point defect engineering
| Autor: | Shao, Lin, Liu, Jiarui, Chen, Quark Y., Chu, Wei-Kan |
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| Zdroj: | In Materials Science & Engineering R 2003 42(3):65-114 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Shao, Lin, Liu, Jiarui, Chen, Quark Y., Chu, Wei-Kan |
|---|---|
| Zdroj: | In Materials Science & Engineering R 2003 42(3):65-114 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect