Improving monocrystalline silicon surface quality with chemical mechanical polishing using the slurry with the additive of isopropanol
| Autor: | Lu, Siwen, Wang, Zhanshan, Yu, Jun, Xia, Jingjing |
|---|---|
| Zdroj: | In Colloids and Surfaces A: Physicochemical and Engineering Aspects 5 June 2024 690 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect