Angstrom surface with high material removal rate for quartz glass induced by silk dissolved novel green chemical mechanical polishing
| Autor: | Liu, Lu, Zhang, Zhenyu, Shi, Chunjing, Deng, Xingqiao, Zhou, Hongxiu, Feng, Junyuan, Liu, Xiuqing, Liu, Xiaoyu, Wen, Wei |
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| Zdroj: | In Colloids and Surfaces A: Physicochemical and Engineering Aspects 5 February 2024 682 |
| Databáze: | ScienceDirect |
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