Investigations on the mechanism of silica particle removal during the Cu buff cleaning process

Autor: Liu, Pengzhan, Hong, Seokjun, Jeon, Sanghuck, Lee, Jaewon, Kwak, Donggeon, Wada, Yutaka, Hiyama, Hirokuni, Hamada, Satomi, Kim, Taesung
Zdroj: In Colloids and Surfaces A: Physicochemical and Engineering Aspects 20 October 2021 627
Databáze: ScienceDirect