Anionic surfactants for defect suppression in 193-nm lithography—Study of the adsorption process by ellipsometry and streaming potential measurements
| Autor: | Förster, A., Drechsler, A., Kobsch, O., Synytska, A., Caspari, A., Bellmann, C., Grundke, K., Stamm, M., Heller, M., Gierth, J., Voigt, M., Völkel, L. |
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| Zdroj: | In Colloids and Surfaces A: Physicochemical and Engineering Aspects 2010 371(1):8-13 |
| Databáze: | ScienceDirect |
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