Ion beam lithography by using highly charged ion beam of Ar
| Autor: | Iwamitsu, Shingo, Nagao, Mamoru, Pahlovy, Shahjada A., Nishimura, Kohei, Kashihara, Masaki, Momota, Sadao, Nojiri, Yoichi, Taniguchi, Jun, Miyamoto, Iwao, Nakao, Takaaki, Morita, Noboru, Kawasegi, Noritaka |
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| Zdroj: | In Colloids and Surfaces A: Physicochemical and Engineering Aspects 1 February 2008 313-314:407-410 |
| Databáze: | ScienceDirect |
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