Tailoring the mechanical properties of SiOxHyCz films deposited by atmospheric pressure microwave plasma torch with a Rechtschaffner design of experiments: A pragmatic statistical approach

Autor: Landreau, Xavier, Chagnon, Pierre, Dublanche-Tixier, Christelle, Jaoul, Cédric, Tristant, Pascal
Zdroj: In Computational Materials Science July 2012 60:32-43
Databáze: ScienceDirect