Low-energy P + ion channeling and implantation into Si(1 1 0), SiC(1 1 0), GaP(1 1 0) and GaAs(1 1 0)
Autor: | Rasulov, A.M., Dzhurakhalov, A.A. |
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Zdroj: | In Computational Materials Science 2005 33(1):148-152 |
Databáze: | ScienceDirect |
Externí odkaz: |
Autor: | Rasulov, A.M., Dzhurakhalov, A.A. |
---|---|
Zdroj: | In Computational Materials Science 2005 33(1):148-152 |
Databáze: | ScienceDirect |
Externí odkaz: |