Nanocrystalline silicon thin films deposited by high-frequency sputtering at low temperature
Autor: | Zhao, Z.X. *, Cui, R.Q., Meng, F.Y., Zhou, Z.B., Yu, H.C., Sun, T.T. |
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Zdroj: | In Solar Energy Materials and Solar Cells 15 February 2005 86(1):135-144 |
Databáze: | ScienceDirect |
Externí odkaz: |