Nanocrystalline silicon thin films deposited by high-frequency sputtering at low temperature

Autor: Zhao, Z.X. *, Cui, R.Q., Meng, F.Y., Zhou, Z.B., Yu, H.C., Sun, T.T.
Zdroj: In Solar Energy Materials and Solar Cells 15 February 2005 86(1):135-144
Databáze: ScienceDirect