Chemistry of the chlorine-terminated surface for low-temperature growth of crystal silicon films by RF plasma-enhanced chemical vapor deposition
| Autor: | Jung, Sughoan, Fujimura, Yukihiro, Ito, Tesuji, Shirai, Hajime * |
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| Zdroj: | In Solar Energy Materials and Solar Cells 2002 74(1):421-427 |
| Databáze: | ScienceDirect |
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