Engineering the defect distribution via boron doping in amorphous TiO2 for robust photocatalytic NO removal

Autor: Jia, Hongbao, Shang, Huan, He, Yue, Gu, Shuwei, Li, Shuangjun, Wang, Qing, Wang, Shike, Peng, Jinghuan, Feng, Xichen, Li, Pengpeng, Xu, Hui, Mao, Chengliang, Li, Hao, Xiao, Shuning, Wang, Ding, Li, Guisheng, Zhang, Dieqing
Zdroj: In Applied Catalysis B: Environment and Energy 5 November 2024 356
Databáze: ScienceDirect