Dielectric properties of RF plasma-deposited a-C:H and a-C:H:N films

Autor: Romanko, L.A, Gontar, A.G *, Kutsay, A.M, Khandozko, S.I, Gorokhov, V.Yu
Zdroj: In Diamond & Related Materials April-May 2000 9(3-6):801-804
Databáze: ScienceDirect