High-quality Cr2O3 - Ga2O3 solid solutions films grown by mist-CVD epitaxy

Autor:	Nikolaev, V.I., Shapenkov, S.V., Timashov, R.B., Stepanov, A.I., Scheglov, M.P., Chikiryaka, A.V., Polyakov, A.Y., Pearton, S.J.
Zdroj:	In Journal of Alloys and Compounds 5 August 2024 994
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect