Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)
| Autor: | Kim, Byunguk, Lee, Namgue, Park, Suhyeon, Park, Taehun, Song, Jaiwon, Han, Seungwook, Park, Hyunwoo, Lee, Dahyun, Kim, Hohoon, Jeon, Hyeongtag |
|---|---|
| Zdroj: | In Journal of Alloys and Compounds 15 March 2021 857 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect