A characteristic improved technique and analysis with plasma treatment to the electrode on oxide-based resistive random access memory
| Autor: | Lin, Chih-Yang, Chang, Ting-Chang, Pan, Chih-Hung, Chen, Min-Chen, Xu, You-Lin, Tan, Yung-Fang, Wu, Pei-Yu, Chen, Chun-Kuei, Huang, Wei-Chen, Lin, Yun-Hsuan, Chao, Yu-Ting, Shou, Cheng-Yun, Ma, Xiao-Hua, Hao, Yue, Sze, Simon M. |
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| Zdroj: | In Journal of Alloys and Compounds 15 March 2020 817 |
| Databáze: | ScienceDirect |
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