Effect of indium doping on the electrical and structural properties of TiO2 thin films used in MOS devices
| Autor: | Djeghlouf, Asmaa, Hamri, Djillali, Teffahi, Abdelkader, Saidane, Abdelkader, Al Mashary, Faisal S., Al Huwayz, Maryam M., Henini, Mohamed, Orak, Ikram, Albadri, Abdulrahman M., Alyamani, Ahmed Y. |
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| Zdroj: | In Journal of Alloys and Compounds 15 February 2019 775:202-213 |
| Databáze: | ScienceDirect |
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