Suppression of Ge-based defects and auto-doping of p-type epitaxial GaAs by employing Al0.3Ga0.7As bi-layer buffer

Autor: Dalapati, G.K., Guhathakurata, S., Das, A., Mahata, C., Chakraborty, S., Bhunia, S., Seng, H.L., Chattopadhyay, S., Bera, L.K., Tripathy, S.
Zdroj: In Journal of Alloys and Compounds 15 October 2018 765:994-1002
Databáze: ScienceDirect