Structure of 3 at.% and 9 at.% Si-doped HfO2 from combined refinement of X-ray and neutron diffraction patterns
| Autor: | Zhao, Lili, Hou, Dong, Usher, Tedi-Marie, Iamsasri, Thanakorn, Fancher, Chris M., Forrester, Jennifer S., Nishida, Toshikazu, Moghaddam, Saeed, Jones, Jacob L. |
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| Zdroj: | In Journal of Alloys and Compounds 15 October 2015 646:655-661 |
| Databáze: | ScienceDirect |
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