Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering
| Autor: | Nazon, J., Sarradin, J., Flaud, V., Tedenac, J.C., Fréty, N. |
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| Zdroj: | In Journal of Alloys and Compounds 2008 464(1):526-531 |
| Databáze: | ScienceDirect |
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