Deposition of alternative plasmonic ZrHfN thin films via closed-field dual-cathode DC unbalanced magnetron sputtering for enhanced SEF substrate applications
Autor: | Chaikeeree, T., Kasayapanand, N., Mungkung, N., Phae-ngam, W., Lertvanithphol, T., Dhanasiwawong, K., Nakajima, H., Gitgeatpong, G., Prathumsit, J., Chittinan, D., Arunrungrusmi, S., Triamnak, N., Horprathum, M. |
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Zdroj: | In Optical Materials April 2024 150 |
Databáze: | ScienceDirect |
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