Deposition of alternative plasmonic ZrHfN thin films via closed-field dual-cathode DC unbalanced magnetron sputtering for enhanced SEF substrate applications

Autor: Chaikeeree, T., Kasayapanand, N., Mungkung, N., Phae-ngam, W., Lertvanithphol, T., Dhanasiwawong, K., Nakajima, H., Gitgeatpong, G., Prathumsit, J., Chittinan, D., Arunrungrusmi, S., Triamnak, N., Horprathum, M.
Zdroj: In Optical Materials April 2024 150
Databáze: ScienceDirect