Submicron gap reduction of micro-resonator based on porous silica ridge waveguides manufactured by standard photolithographic process
| Autor: | Lorrain, N., Pirasteh, P., Girault, P., Azuelos, P., Lemaître, J., Guendouz, M., Hardy, I., Thual, M., Charrier, J. |
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| Zdroj: | In Optical Materials February 2019 88:210-217 |
| Databáze: | ScienceDirect |
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