Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist
| Autor: | Gâté, V., Jourlin, Y., Vocanson, F., Dellea, O., Vercasson, G., Reynaud, S., Riassetto, D., Langlet, M. |
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| Zdroj: | In Optical Materials July 2013 35(9):1706-1713 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect