Deposition of Ge-doped silica thin films for an integrated optic application using a matrix distributed electron cyclotron resonance PECVD reactor

Autor: Botha, Roelene a, ⁎, 1, Bulkin, Pavel V. b, Swart, Pieter L. a
Zdroj: In Optical Materials October 2007 30(2):244-247
Databáze: ScienceDirect