Deposition of Ge-doped silica thin films for an integrated optic application using a matrix distributed electron cyclotron resonance PECVD reactor
Autor: | Botha, Roelene a, ⁎, 1, Bulkin, Pavel V. b, Swart, Pieter L. a |
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Zdroj: | In Optical Materials October 2007 30(2):244-247 |
Databáze: | ScienceDirect |
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