Glassy mAs 2S 3· nAs 2Se 3 photoresist films for interference laser lithography
| Autor: | Arsh, A, Klebanov, M, Lyubin, V, Shapiro, L, Feigel, A, Veinger, M, Sfez, B |
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| Zdroj: | In Optical Materials 2004 26(3):301-304 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Arsh, A, Klebanov, M, Lyubin, V, Shapiro, L, Feigel, A, Veinger, M, Sfez, B |
|---|---|
| Zdroj: | In Optical Materials 2004 26(3):301-304 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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