Efficacy of low etch rate in achieving nanometer-scale smoothness of Si (1 0 0) and (1 1 0) plane surfaces using KOH and KOH/IPA solutions for optical mold applications
| Autor: | An, Shinmo, Lee, Seung Gol, Park, Se-Guen, Lee, El-Hang, O, Beom-Hoan |
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| Zdroj: | In Sensors & Actuators: A. Physical 1 March 2014 209:124-132 |
| Databáze: | ScienceDirect |
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