Etch rates and morphology of silicon ( h k l) surfaces etched in KOH and KOH saturated with isopropanol solutions

Autor:	Zubel, I., Kramkowska, M.
Zdroj:	In Sensors & Actuators: A. Physical 2004 115(2):549-556
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect