All-photoplastic microstencil with self-alignment for multiple layer shadow-mask patterning
| Autor: | Kim, Gyuman, Kim, Beomjoon, Brugger, Jürgen |
|---|---|
| Zdroj: | In Sensors & Actuators: A. Physical 2003 107(2):132-136 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Kim, Gyuman, Kim, Beomjoon, Brugger, Jürgen |
|---|---|
| Zdroj: | In Sensors & Actuators: A. Physical 2003 107(2):132-136 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect