Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD
| Autor: | Voz, C *, Peiró, D, Bertomeu, J, Soler, D, Fonrodona, M, Andreu, J |
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| Zdroj: | In Materials Science & Engineering B 2000 69:278-283 |
| Databáze: | ScienceDirect |
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