The evolution of cavities in Si at the 3C-SiC/Si interface during 3C-SiC deposition by LPCVD
Autor: | Papaioannou, V. *, Möller, H., Rapp, M., Vogelmeier, L., Eickhoff, M., Krötz, G., Stoemenos, J. |
---|---|
Zdroj: | In Materials Science & Engineering B 1999 61:539-543 |
Databáze: | ScienceDirect |
Externí odkaz: |