Laser annealing of the Si layers in Si/SiO 2 multiple quantum wells
Autor: | Arguirov, T., Mchedlidze, T., Kouteva-Arguirova, S., Kittler, M., Rölver, R., Berghoff, B., Bätzner, D., Spangenberg, B. |
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Zdroj: | In Materials Science & Engineering B 2009 159:57-60 |
Databáze: | ScienceDirect |
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