Formation and annealing behavior of prominent point defects in MeV ion implanted n-type epitaxial Si

Autor: Vines, L., Monakhov, E.V., Jensen, J., Kuznetsov, A.Yu., Svensson, B.G.
Zdroj: In Materials Science & Engineering B 2009 159:177-181
Databáze: ScienceDirect