Evaluation of local strain in Si using UV-Raman spectroscopy
| Autor: | Ogura, Atsushi, Kosemura, Daisuke, Takei, Munehisa, Uchida, Hidetsugu, Hattori, Nobuyoshi, Yoshimaru, Masaki, Mayuzumi, Satoru, Wakabayashi, Hitoshi |
|---|---|
| Zdroj: | In Materials Science & Engineering B 2009 159:206-211 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect