Gas phase considerations for the growth of device quality nanocrystalline silicon at high rate
| Autor: | Rath, J.K., Verkerk, A.D., Liu, Y., Brinza, M., Goedheer, W.J., Schropp, R.E.I. |
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| Zdroj: | In Materials Science & Engineering B 2009 159:38-43 |
| Databáze: | ScienceDirect |
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