Investigation of the relaxation behavior of Si 1− xC x alloys during epitaxial UHV-CVD growth
| Autor: | Ostermay, I., Kammler, T., Naumann, A., Bartha, J.W., Kücher, P. |
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| Zdroj: | In Materials Science & Engineering B 2008 154:90-94 |
| Databáze: | ScienceDirect |
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