Effect of growth parameters on the heteroepitaxy of 3C-SiC on 6H-SiC substrate by chemical vapor deposition

Autor: Soueidan, M. a, b, ⁎, Ferro, G. a, Nsouli, B. b, Cauwet, F. a, Dazord, J. a, Younes, G. c, Monteil, Y. a
Zdroj: In Materials Science & Engineering B 2006 130(1):66-72
Databáze: ScienceDirect