Si nanocrystals by ultra-low energy ion implantation for non-volatile memory applications
| Autor: | Coffin, H., Bonafos, C., Schamm, S., Carrada, M., Cherkashin, N., Ben Assayag, G., Dimitrakis, P., Normand, P., Respaud, M., Claverie, A. |
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| Zdroj: | In Materials Science & Engineering B 2005 124:499-503 |
| Databáze: | ScienceDirect |
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