Advanced activation of ultra-shallow junctions using flash-assisted RTP

Autor: Lerch, W., Paul, S., Niess, J., McCoy, S., Selinger, T., Gelpey, J., Cristiano, F., Severac, F., Gavelle, M., Boninelli, S., Pichler, P., Bolze, D.
Zdroj: In Materials Science & Engineering B 2005 124:24-31
Databáze: ScienceDirect