Comprehensive modeling of ion-implant amorphization in silicon
| Autor: | Mok, K.R.C., Jaraiz, M., Martin-Bragado, I., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P., Benistant, F. |
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| Zdroj: | In Materials Science & Engineering B 2005 124:383-385 |
| Databáze: | ScienceDirect |
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