Boron diffusion in amorphous silicon

Autor: Venezia, V.C., Duffy, R., Pelaz, L., Hopstaken, M.J.P., Maas, G.C.J., Dao, T., Tamminga, Y., Graat, P.
Zdroj: In Materials Science & Engineering B 2005 124:245-248
Databáze: ScienceDirect