Boron diffusion in amorphous silicon
Autor: | Venezia, V.C., Duffy, R., Pelaz, L., Hopstaken, M.J.P., Maas, G.C.J., Dao, T., Tamminga, Y., Graat, P. |
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Zdroj: | In Materials Science & Engineering B 2005 124:245-248 |
Databáze: | ScienceDirect |
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