A comprehensive solution for simulating ultra-shallow junctions: From high dose/low energy implant to diffusion annealing
| Autor: | Boucard, F., Roger, F., Chakarov, I., Zhuk, V., Temkin, M., Montagner, X., Guichard, E., Mathiot, D. |
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| Zdroj: | In Materials Science & Engineering B 2005 124:409-414 |
| Databáze: | ScienceDirect |
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