Boron distribution in silicon after excimer laser annealing with multiple pulses

Autor: Monakhov, E.V., Svensson, B.G., Linnarsson, M.K., La Magna, A., Italia, M., Privitera, V., Fortunato, G., Cuscunà, M., Mariucci, L.
Zdroj: In Materials Science & Engineering B 2005 124:228-231
Databáze: ScienceDirect