Boron distribution in silicon after excimer laser annealing with multiple pulses
Autor: | Monakhov, E.V., Svensson, B.G., Linnarsson, M.K., La Magna, A., Italia, M., Privitera, V., Fortunato, G., Cuscunà, M., Mariucci, L. |
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Zdroj: | In Materials Science & Engineering B 2005 124:228-231 |
Databáze: | ScienceDirect |
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