Highly efficient silver patterning without photo-resist using simple silver precursors
Autor: | Byun, Younghun *, Hwang, Eoc-Chae, Lee, Sang-Yun, Lyu, Yi-Yeol, Yim, Jin-Heong, Kim, Jin-Young, Chang, Seok, Pu, Lyong Sun, Kim, Ji Man |
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Zdroj: | In Materials Science & Engineering B 2005 117(1):11-16 |
Databáze: | ScienceDirect |
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