Highly efficient silver patterning without photo-resist using simple silver precursors

Autor: Byun, Younghun *, Hwang, Eoc-Chae, Lee, Sang-Yun, Lyu, Yi-Yeol, Yim, Jin-Heong, Kim, Jin-Young, Chang, Seok, Pu, Lyong Sun, Kim, Ji Man
Zdroj: In Materials Science & Engineering B 2005 117(1):11-16
Databáze: ScienceDirect