Fundamental characterization of the effect of nitride sidewall spacer process on boron dose loss in ultra-shallow junction formation
| Autor: | Kohli, P. *, Chakravarthi, S., Jain, Amitabh, Bu, H., Mehrotra, M., Dunham, S.T., Banerjee, S.K. |
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| Zdroj: | In Materials Science & Engineering B 2004 114:390-396 |
| Databáze: | ScienceDirect |
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