The role of silicon interstitials in the deactivation and reactivation of high concentration boron profiles

Autor: Aboy, Maria *, Pelaz, Lourdes, Marqués, Luis A., López, Pedro, Barbolla, Juan, Venezia, V.C., Duffy, R., Griffin, Peter B.
Zdroj: In Materials Science & Engineering B 15 December 2004 114-115:193-197
Databáze: ScienceDirect