The role of silicon interstitials in the deactivation and reactivation of high concentration boron profiles
Autor: | Aboy, Maria *, Pelaz, Lourdes, Marqués, Luis A., López, Pedro, Barbolla, Juan, Venezia, V.C., Duffy, R., Griffin, Peter B. |
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Zdroj: | In Materials Science & Engineering B 15 December 2004 114-115:193-197 |
Databáze: | ScienceDirect |
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