Advanced front-end processes for the 45 nm CMOS technology node
| Autor: | Collart, E.J.H. *, Felch, S.B., Graoui, H., Kirkwood, D., Tallavarjula, S., Berg, J.A. Van den, Hamilton, J., Cowern, N.E.B., Kirkby, K.J. |
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| Zdroj: | In Materials Science & Engineering B 2004 114:118-129 |
| Databáze: | ScienceDirect |
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