Hafnium silicon oxide films prepared by atomic layer deposition
| Autor: | Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku, Sajavaara, Timo, Keinonen, Juhani, Gilmer, David C, Tobin, Philip J |
|---|---|
| Zdroj: | In Materials Science & Engineering B 15 June 2004 109(1-3):2-5 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect