Nanocomposite Ti–Si–N films deposited by reactive unbalanced magnetron sputtering at room temperature
Autor: | Jiang, Ning, Shen, Y.G, Mai, Y.-W, Chan, Tai, Tung, Simon C |
---|---|
Zdroj: | In Materials Science & Engineering B 2004 106(2):163-171 |
Databáze: | ScienceDirect |
Externí odkaz: |